Chin-Chun Wang received his B.S degree (1955) in Chemical Engineering from the National Taiwan University, Taiwan, China, the M.S. degree (1959) in Chemical Engineering from Kansas State University, and Ph.D. degree (1962) in Physical Chemistry from Colorado State University. From 1962 to 1963 he received post-doctoral training in physical chemistry at the University of Kansas. In 1963 Dr. Wang joined the research staff of RCA Laboratories where he has been engaged in research on synthesis and characterization of a wide variety of electronic materials, including wide-bandgap III-V semiconductors, ferromagnetic transition-metal oxides, refractory dielectrics, thin-film polymers, and thin-film photoconductors. Many of these studies have led to the realization of practical devices in the areas of photoemission, electro-optics, video systems, and integrated electronics.

Dr. Wang's specialized research interest and experience are in the fields of (1) crystal growth and vapor-phase deposition of electronic materials, (2) thermodynamics and kinetics of thin-film systems, (3) physics and chemistry of surfaces and thin films, and (4) vacuum science and technology. Dr. Wang received five RCA Laboratories Achievement Awards and was appointed a Fellow of the Technical Staff in 1973.

Dr. Wang is a member of the American Chemical Society, American Physical Society, American Vacuum Society, The Electrochemical Society, Sigma Xi, Sigma Pi Sigma, and Phi Lambda Upsilon. He is listed in American Men of Science, Leading Men in the United States of America, Who's Who in the East, and International Biography of Contemporary Achievement.
- RCA 1982 Company Biography

See Chin-Chun Wang on slide 450 from Memories of VideoDisc.

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